Process flow controllers are high-speed closed-loop process gas controllers, designed for real-time, in-situ precision control of reactive sputtering-based vacuum coating and plasma treatment processes. They are complete, compact, flexible, convenient to use, and economical solutions which can be readily integrated into new as well as existing systems. Equally at home in production or R&D tools, process flow controllers can bring about demonstrable improvements in process stability, repeatability, and yield. A wide range of accessories are available including sensors specifically designed for HIPMS Sputtering Applications.
Process control is essential in industrial plasma applications to ensure reliability and high quality of the process. Here, optical emission spectroscopy (OES) is a first choice technique since it does not affect the plasma and since real-time monitoring of several plasma species is possible. Our PLASUS EMICON systems come with all the features you need to analyze, optimize and control your plasma application.